Seminar Talk by Dr. Arie den Boef from ASML


All members,

SPIE Student Chapter, TU Delft, is organizing a seminar talk. The speaker will be Dr. Arie den Boef, currently working as ‘Research fellow’ at ASML and is the person for bringing the Yield Star product in ASML. Yield star measures structure printed on wafers.

ASML, based in Veldhoven, Netherlands, is the dominant supplier of nanolithography patterning equipment for the semiconductor industry.

Dr. den Boef will provide an overview of the company and ongoing R&D activities.

Drinks and snacks will be provided.

If you would like to join the talk, please register yourself here:


When:  16:00-17:30, Tuesday, 11th October 2016

Where: TN-Collegezaal E (F005), Faculty of Applied Sciences, TU Delft

Address: Lorentzweg 1, 2628 CJ Delft, Netherlands

Title: Optical Metrology of Semiconductor Wafers in Lithography


 The minimum feature size or Critical Dimension (CD) in micro-electronic semiconductor devices (“chips”) is steadily decreasing which enables chips with more computing power and/or storage capacity at lower cost and lower power dissipation. The impact of this trend is, for example, clearly visible in mobile communication: Thirty years ago a portable telephone had a weight of about 1 kg, would cost several thousands of dollars and it only allowed phone calls. Today, a high-end smartphone weighs only about 120 grams costs a few hundred dollars, fits in your pocket and offers a wealth of functions that were unheard of 30 years ago like navigation, high-speed global connectivity and built-in camera’s with high-definition video capabilities.

Optical Lithography is an essential step in the production of chips since it defines the dimensions and density of the device patterns. After the lithography step, these device patterns also need to be inspected for CD variations and pattern placement errors (overlay) before the wafer undergoes an irreversible process step like etching.

In this presentation, we will first give a brief introduction about ASML who manufactures these lithography machines. We will then present an optical metrology technique that ASML has developed for the metrology of CD and overlay.

About Dr. Arie J. den Boef


Worked at Philips from 1979 – 1997

Joined ASML in 1997 and is working in an area of optical measurement systems.

Inventor of ASML product YieldStar.

Current job position at ASML: Research Fellow.


Also, please have a look at our poster below:



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